Publication detail
Imaging reflectometery in situ
URBÁNEK, M. SPOUSTA, J. BĚHOUNEK, T. ŠIKOLA, T.
Czech title
In situ zobrazovací reflektometrie
English title
Imaging reflectometery in situ
Type
journal article - other
Language
en
Original abstract
An innovative method of in situ real-time optical monitoring of thin film deposition and etching is presented. In this technique, intensity maps of a thin film corresponding to a series of wavelengths selected by a monochromator 300 – 800 nm are recorded by a CCD camera. From the maps the reflectance spectra at individual points of the sample surface can be extracted. By fitting the reflectance spectra to the theoretical ones, the maps of a thin film morphology (including optical parameters) and their temporal development during technological processes can be obtained. The method was tested by in situ observation of the growth of silicon nitride and silicon oxide thin films prepared by ion beam sputtering and by the monitoring of etching of thermally grown SiO2 thin films.
Czech abstract
In situ zobrazovací reflektometrie
English abstract
An innovative method of in situ real-time optical monitoring of thin film deposition and etching is presented. In this technique, intensity maps of a thin film corresponding to a series of wavelengths selected by a monochromator 300 – 800 nm are recorded by a CCD camera. From the maps the reflectance spectra at individual points of the sample surface can be extracted. By fitting the reflectance spectra to the theoretical ones, the maps of a thin film morphology (including optical parameters) and their temporal development during technological processes can be obtained. The method was tested by in situ observation of the growth of silicon nitride and silicon oxide thin films prepared by ion beam sputtering and by the monitoring of etching of thermally grown SiO2 thin films.
Keywords in Czech
Reflektometrie; Tenké vrstvy; Optická characterizace
Keywords in English
Reflectometry; Thin films; Optical characterization
RIV year
2007
Released
23.08.2007
ISSN
0003-6935
Journal
Applied Optics
Volume
46
Number
25
Pages from–to
6309–6313
Pages count
5
BIBTEX
@article{BUT44051,
author="Michal {Urbánek} and Jiří {Spousta} and Tomáš {Běhounek} and Tomáš {Šikola},
title="Imaging reflectometery in situ",
journal="Applied Optics",
year="2007",
volume="46",
number="25",
month="August",
pages="6309--6313",
issn="0003-6935"
}