Publication detail
STUDY OF THE INFLUENCE OF SOLVENT ON TRANSMISSION QUALITY GRAPHENE
ZAHRADNÍČEK, R. HOUŠKA, P.
Czech title
STUDIUM VLIVU ROZPOUŠTEDLA NA KVALITU PŘENOSU GRAFENU
English title
STUDY OF THE INFLUENCE OF SOLVENT ON TRANSMISSION QUALITY GRAPHENE
Type
conference paper
Language
en
Original abstract
The standard methods of transferring graphene onto semiconductor substrates apply acetone to solve the layer of polymethyl methacrylate (PMMA) on the surface of graphene layer at the end of ‘wet transfer process’. During this process, however, impurities on the order of nanometres get entrapped and have a subsequent negative effect on the practical utilization of graphene in the field of optoelectronics. To optimize the wet transfer of graphene using PMMA as a supporting polymer, several solvents were compared in terms of resulting contamination. The solvents subjected to the research included: acetone, chloroform, dimethyl succinate (DMG), and n-ethyl pyrrolidone (NEP). The lowest graphene contamination at the end of transfer process was achieved with NEP solvent, which was studied using atomic force microscopy (AFM).
Czech abstract
Standardní metodika přenosu grafenu na polovodičové substráty využívá aceton k rozpuštění vrstvy polymetakrylátu (PMMA) z povrchu grafenové vrstvy na konci tzv. mokrého přenosu. Při tomto postupu však dochází k ulpívání nečistot v řádu nanometrů, které mají následně negativní vliv na praktické využití grafenu v oblasti optoelektroniky. Za účelem optimalizace mokrého přenosu grafenu využívající PMMA jako podpůrného polymeru bylo provedeno srovnání několika rozpouštědel z hlediska výsledné kontaminace. Mezi rozpouštědly, které se staly předmětem výzkumu byly aceton, chloroform, dimetylsucinat (DMG) a n-ethylpyrolidon (NEP). Nejnižší kontaminace grafenu na konci přenosového procesu bylo dosaženo užitím rozpouštědla NEP, což bylo studováno pomocí atomární mikroskopie (AFM).
English abstract
The standard methods of transferring graphene onto semiconductor substrates apply acetone to solve the layer of polymethyl methacrylate (PMMA) on the surface of graphene layer at the end of ‘wet transfer process’. During this process, however, impurities on the order of nanometres get entrapped and have a subsequent negative effect on the practical utilization of graphene in the field of optoelectronics. To optimize the wet transfer of graphene using PMMA as a supporting polymer, several solvents were compared in terms of resulting contamination. The solvents subjected to the research included: acetone, chloroform, dimethyl succinate (DMG), and n-ethyl pyrrolidone (NEP). The lowest graphene contamination at the end of transfer process was achieved with NEP solvent, which was studied using atomic force microscopy (AFM).
Keywords in Czech
Grafen, přenos grafenu, rozpouštědla, PMMA, AFM
Keywords in English
Graphene, graphene transfer, solvents, PMMA, AFM
Released
19.10.2016
ISBN
978-80-87294-71-0
Book
NANOCON 2016
Pages from–to
42–42
Pages count
148
BIBTEX
@inproceedings{BUT129295,
author="Radim {Zahradníček} and Pavel {Houška},
title="STUDY OF THE INFLUENCE OF SOLVENT ON TRANSMISSION QUALITY GRAPHENE",
booktitle="NANOCON 2016",
year="2016",
month="October",
pages="42--42",
isbn="978-80-87294-71-0"
}