Detail publikace
An in situ study of processes taking place on a silicon surface during bombardment by CFx/Ar ions – etching versus polymerization
ŠIKOLA, T. ARMOUR, D. VAN DEN BERG, J.
Anglický název
An in situ study of processes taking place on a silicon surface during bombardment by CFx/Ar ions - etching versus polymerization
Typ
kapitola v knize
Jazyk
en
Rok RIV
1994
Vydáno
01.01.1994
Nakladatel
Institut für Ionenphysik, Universität Innsbruck
Místo
Hintermoos/Maria Alm, Univ. Innsbruck,
Kniha
SASP 94 - Symposium on atomic, cluster and surface physics
Počet stran
7
BIBTEX
@inbook{BUT51967,
author="Tomáš {Šikola} and Dave {Armour} and Jaap {Van den berg},
title="An in situ study of processes taking place on a silicon surface during bombardment by CFx/Ar ions – etching versus polymerization",
booktitle="SASP 94 - Symposium on atomic, cluster and surface physics",
year="1994",
month="January",
publisher="Institut für Ionenphysik, Universität Innsbruck",
address="Hintermoos/Maria Alm, Univ. Innsbruck,"
}