Detail publikace
Influence of Deposition Parameters on the Plasmonic Properties of Gold Nanoantennas Fabricated by Focused Ion Beam Lithography
FOLTÝN, M. PATOČKA, M. ŘEPA, R. ŠIKOLA, T. HORÁK, M.
Anglický název
Influence of Deposition Parameters on the Plasmonic Properties of Gold Nanoantennas Fabricated by Focused Ion Beam Lithography
Typ
článek v časopise ve Web of Science, Jimp
Jazyk
en
Originální abstrakt
The behavior of plasmonic antennas is influenced by a variety of factors, including their size, shape, and material. Even minor changes in the deposition parameters during the thin film preparation process may have a significant impact on the dielectric function of the film, and thus on the plasmonic properties of the resulting antenna. In this work, we deposited gold thin films with thicknesses of 20, 30, and 40 nm at various deposition rates using an ion-beam-assisted deposition. We evaluate their morphology and crystallography by atomic force microscopy, X-ray diffraction, and transmission electron microscopy. Next, we examined the ease of fabricating plasmonic antennas using focused-ion-beam lithography. Finally, we evaluate their plasmonic properties by electron energy loss spectroscopy measurements of individual antennas. Our results show that the optimal gold thin film for plasmonic antenna fabrication of a thickness of 20 and 30 nm should be deposited at the deposition rate of around 0.1 nm/s. The thicker 40 nm film should be deposited at a higher deposition rate like 0.3 nm/s.
Anglický abstrakt
The behavior of plasmonic antennas is influenced by a variety of factors, including their size, shape, and material. Even minor changes in the deposition parameters during the thin film preparation process may have a significant impact on the dielectric function of the film, and thus on the plasmonic properties of the resulting antenna. In this work, we deposited gold thin films with thicknesses of 20, 30, and 40 nm at various deposition rates using an ion-beam-assisted deposition. We evaluate their morphology and crystallography by atomic force microscopy, X-ray diffraction, and transmission electron microscopy. Next, we examined the ease of fabricating plasmonic antennas using focused-ion-beam lithography. Finally, we evaluate their plasmonic properties by electron energy loss spectroscopy measurements of individual antennas. Our results show that the optimal gold thin film for plasmonic antenna fabrication of a thickness of 20 and 30 nm should be deposited at the deposition rate of around 0.1 nm/s. The thicker 40 nm film should be deposited at a higher deposition rate like 0.3 nm/s.
Klíčová slova anglicky
Antennas; Deposition; Grain; Plasmonics; Thin Films
Vydáno
20.08.2024
Nakladatel
AMER CHEMICAL SOC
Místo
WASHINGTON
ISSN
2470-1343
Ročník
9
Číslo
35
Strany od–do
37408–37416
Počet stran
9
BIBTEX
@article{BUT189679,
author="Michael {Foltýn} and Marek {Patočka} and Rostislav {Řepa} and Tomáš {Šikola} and Michal {Horák},
title="Influence of Deposition Parameters on the Plasmonic Properties of Gold Nanoantennas Fabricated by Focused Ion Beam Lithography",
year="2024",
volume="9",
number="35",
month="August",
pages="37408--37416",
publisher="AMER CHEMICAL SOC",
address="WASHINGTON",
issn="2470-1343"
}